FACILITIES

Material synthesis and Device fabrication

Electron-beam lithography & Device Processing

We use a JEOL 845 SEM (30 kV) equipped with a Nanometer Pattern Generation System: NPGS for device fabrication,

currently capable of 40 nm line widths

Chemical Vapor Deposition (CVD) system for nanostructure synthesis

(Production of CNT morphologies and graphite)

Thin Film evaporation

Varian 3118 Sputtering system for metal and semiconductor deposition

(DC/RF sputtering/co-sputtering, Three cathodes: 2” targets, substrate heater, Base vacuum < 5 E-7 Torr)

Controlled environment Vacuum System

For characterization of nanostructures

Characterization

Surface morphology through Atomic Force Microscopy (Multimode, from Digital Instruments)

(equipped with modules for Magnetic Force Microscopy, Scanning Electrochemical Microscopy and Scanning Tunneling Microscopy)

Electrical properties of nanostructures

· Probe stations (Manual & Automatic)

· Lock-in amplifiers: SR830 (102 kHz) and SR844 (200 MHz)

· Oscilloscopes: Infinium (500 MHz) and Tektronix

· LCR meter (HP 4284A)

· RF-Impedance Analyzer (Agilent 4991A)

Thermal properties of nanostructures and polymer composites

· Seebeck coefficient measurement

· Vacuum furnaces

Electrochemistry

Gamry PCI4-300 Galvanostat/Potentiostat

Low temperature measurement

· Janis CCS-450 optical cryostat (10K – 450K)

Shared Facilities on the UC, San Diego campus

W.M. Keck Center for Interfaces and Materials Science (CIMS)

· X-ray diffraction

· Superconducting Quantum Interference Device (SQUID) Magnetometry

Nano3 – a clean room facility for device fabrication

· Electron-beam evaporators

· DC and RF sputtering, Ion beam deposition systems

· Stylus profilometers

· Vacuum heat treatment furnaces

Environmental Scanning Electron Microscope (E-SEM)

Transmission Electron Microscope (TEM) at the National Center for Microscopy Imaging and Research (NCMIR)